The Atomic Level Characterization (ALC) symposium brings together experts in atomic level characterization from around the world. ALC is a series of international symposia that began in 1996 in Kyoto, Japan, and focuses on practical applications of atomic level characterization of new materials and devices.

The goal of the ALC symposium is to promote stimulating discussions among researchers specializing in different probe methods. The symposium also encourages discussion of fundamental problems to be solved in the further development of atomic level characterization of materials, including approaches based on theory and simulations. Descriptions of new applications and instrumentation for various analytical techniques of surface and interface analysis are also solicited.

This year's symposium will be held in Hawaii, United States, offering attendees the opportunity to explore the beauty of the islands while learning about the latest developments in atomic level characterization. Don't miss this chance to gain valuable insights and network with experts in the field.