The International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, widely recognized as EIPBN, is acknowledged as a leading forum for the exchange of knowledge and ideas in the field of advanced lithography and nanofabrication. This esteemed event, known affectionately as "3-Beams," has been attended by scientists and engineers who are at the forefront of electron, ion, and photon lithography, imaging, and analysis. An emphasis is placed on atomically precise fabrication and the exploration of nanofabrication process technologies, as well as related emerging technologies that have far-reaching applications across various industries.

At the 65th meeting of EIPBN, a diverse array of top researchers from academia, government laboratories, and industry are brought together to engage in meaningful discussions. Recent trends and future directions in these cutting-edge technologies are presented and examined, providing a rich tapestry of insights and innovations. The event serves as a pivotal platform where the latest advancements are shared, and collaborative opportunities are fostered, ensuring that attendees remain at the vanguard of technological progress.

Participation in EIPBN offers a unique opportunity for engagement with a global community of experts who are dedicated to pushing the boundaries of what is possible in the realms of nanotechnology and beam technology. The conference is characterized by its vibrant exchange of ideas, where groundbreaking research and pioneering applications are showcased. Attendees are provided with a comprehensive understanding of the current landscape and future potential of these transformative technologies, making it an invaluable experience for those invested in the field.