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April 1st, 2026

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April 30th, 2026

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PHOTOMASK JAPAN Apr. 2026

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Event Information

Photomask Japan Apr. is an international symposium that brings together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies. It is a unique opportunity for professionals in the industry to come together and exchange ideas and knowledge, as well as network with peers. The event will be held in the vibrant city of Yokohama, Japan, and promises to be an engaging and informative experience.

The symposium will feature presentations from leading experts in the field, covering topics such as the latest advancements in photomask and NGL mask technologies, as well as their applications in various industries. Attendees will also have the chance to participate in panel discussions and workshops, providing them with an opportunity to gain valuable insights into the industry. Additionally, the event will feature an exhibition space, where exhibitors can showcase their products and services.

Photomask Japan Apr. is the perfect event for professionals in the photomask and NGL mask industry to come together and share their knowledge and expertise. With its convenient location in the heart of Yokohama, Japan, the event promises to be an unforgettable experience. Don't miss this opportunity to be part of the international symposium and join the conversation.

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Organizer(s)

SPIE (International Society for Optical Engineering)

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Location

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1-1-1, Minato Mirai, Nishi-ku, Yokohama, Japan, Japan

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Floor Plan(s)

Supporting documents (if any)

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