The AVS 22nd International Conference on Atomic Layer Deposition (ALD 2022) along with the 9th International Atomic Layer Etching Workshop (ALE 2022) is being presented as a premier three-day event focusing on the cutting-edge advancements in atomic layer controlled deposition of thin films. The event is recognized for its role in fostering a collaborative environment where scientific ideas and technological practices are exchanged among global participants. The inclusion of the ALE 2022 Workshop is designed to enhance the experience by offering attendees the opportunity to engage with the latest developments in atomic layer etching.

A comprehensive program is being planned, featuring a day of tutorials and a welcome reception to set the stage for the main sessions. Over the course of the event, a dynamic industry tradeshow will be hosted, providing a platform for showcasing innovative products and services. Attendees will benefit from the audio-recorded presentations, which will be made available post-conference, ensuring that the wealth of knowledge shared is accessible for future reference. This format is intended to maximize the learning experience and facilitate ongoing professional development.

With an anticipated attendance of over 800 participants, the conference is expected to be a hub of activity, drawing experts and industry leaders from around the world. The strategic location of the event has been chosen to offer a conducive atmosphere for networking and collaboration. Exhibitors will find a unique opportunity to engage with a targeted audience, driving business growth and establishing valuable connections. The ALD/ALE 2022 event is poised to be an influential gathering, setting the stage for future innovations in the field of atomic layer technologies.