The SPIE Advanced Lithography + Patterning Symposium has been providing a platform to showcase the latest advances in lithography and patterning technology for over four decades. This symposium, taking place at 150 West San Carlos, San Jose, San Jose CA, United States, will cover the full spectrum of the advances and challenges in state-of-the art lithography and integrated patterning technology through several topical conferences.

The technology landscape keeps on evolving to incubate more sophisticated and diversified information and computing technologies. The semiconductor technology sector, now in the More-than-Moore era, is facing more challenges that require holistic patterning solutions that involve a higher level of interactions among process technologies, devices, and system design sectors. Advances in areas of nano- and micro-patterning for semiconductor IC device applications will be presented in sessions covering optical lithography, extreme-UV (EUV) lithography, computational patterning, metrology/inspection, patterning materials, etch/deposition technology, and System-Design-Technology co-optimization.

As novel patterning and non-IC lithography technologies, such as heterogenous wafer packaging, IoT devices including micro-machines and microsensors, AR/VR devices, FP Displays, have become more widely explored, related topics in these areas will also be addressed. Attendees of this symposium will have the opportunity to gain insight into the latest advances in lithography and patterning technology, as well as network with industry experts.