The SPIE Advanced Lithography + Patterning Symposium has been the go-to event for the latest advances in lithography and patterning technology for over four decades. With the ever-evolving technology landscape, the symposium provides a platform for the incubation of more sophisticated and diversified information and computing technologies.

The symposium will cover the full spectrum of the advances and challenges in state-of-the art lithography and integrated patterning technology through several topical conferences. It will bring together experts from the semiconductor technology sector, now in the More-than-Moore era, to discuss the higher level of interactions among process technologies, devices, and system design sectors.

The event will be held at 150 West San Carlos, San Jose, San Jose CA, United States. It will cover topics such as optical lithography, extreme-UV (EUV) lithography, computational patterning, metrology/inspection, patterning materials, etch/deposition technology, and System-Design-Technology co-optimization. It will also address novel patterning and non-IC lithography technologies, such as heterogenous wafer packaging, IoT devices including micro-machines and microsensors, AR/VR devices, FP Displays.