Discover the latest advances in lithography and patterning technology at the SPIE Advanced Lithography + Patterning Symposium. With over four decades of showcasing cutting-edge innovations, this symposium is a must-attend event for professionals in the semiconductor technology sector. As the industry enters the More-than-Moore era, new challenges arise that demand holistic patterning solutions. This symposium brings together experts from various fields to discuss the advances and challenges in state-of-the-art lithography and integrated patterning technology.

Explore a wide range of topics in sessions covering optical lithography, extreme-UV (EUV) lithography, computational patterning, metrology/inspection, patterning materials, etch/deposition technology, and System-Design-Technology co-optimization. Dive into the world of nano- and micro-patterning for semiconductor IC device applications and gain valuable insights into the latest trends and developments.

But the symposium doesn't stop there. As the industry expands into novel patterning and non-IC lithography technologies, such as heterogenous wafer packaging, IoT devices, AR/VR devices, and FP Displays, related topics in these areas will also be addressed. Don't miss this opportunity to connect with industry leaders, expand your knowledge, and stay ahead of the curve in the ever-evolving world of lithography and patterning technology.